The magnetron multi arc sputtering coating machine generates glow discharge between the anode and cathode in a vacuum state, and gas molecules between the electrodes are ionized to generate charged charges. Positive ions are accelerated by the negative potential of the bright electrode and collide with the target material on the cathode, splashing out its atoms and other particles. The splashed atoms deposit on the anode substrate to form a thin film. This physical phenomenon is called sputtering, which can be used for surface coating of various metals and non-metals and is an ideal equipment for industrial production.